%0 Journal Article
%T INVESTIGATING THE REMOVAL RATE OF PYROGENIC SiO2  BY PLASMA CHEMICAL ETCHING
%A Adamov, A.A.
%A Golovko, A.S.
%A Malakhanov, A.A.
%A Vasil'eva, Y.O.
%A Pavlov, A.V.
%K etching, removal rate, pyrogenic SiO2, pressure, power, gases, temperature, reactive ion plasma-chemical etching unit
%J Automation and modeling in design and management
%D 2024
%N 2024
%P 7
%I Bryansk State Technical University